The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 25, 2006
Filed:
Dec. 11, 2003
Yadagiri R. Pendri, South Glastonbury, CT (US);
Chung-pin H. Chen, Madison, CT (US);
Sunil S. Patel, Fords, NJ (US);
Jeffrey M. Evans, Manlius, NY (US);
Jing Liang, Princeton, NJ (US);
David R. Kronenthal, Yardley, PA (US);
Gerald L. Powers, North Brunswick, NJ (US);
Siva Josyula Prasad, Kendall Park, NJ (US);
Jeffrey T. Bien, Princeton, NJ (US);
Zhongping Shi, West Windsor, NJ (US);
Ramesh N. Patel, Bridgewater, NJ (US);
Amit Banerjee, St. Louis, MO (US);
Yeung Yu Chan, Kendall Park, NJ (US);
Sushil K. Rijhwani, Robbinsville, NJ (US);
Ambarish K. Singh, Bordentown, NJ (US);
Shaopeng Wang, King of Prussia, PA (US);
Milan Stojanovic, Fort Lee, NJ (US);
David J. Kucera, Del Mar, CA (US);
Richard P. Polniaszek, Redwood City, CA (US);
Charles Lewis, Fairfield, NJ (US);
John Thottathil, Ivanhoe, IL (US);
Dhileepkumar Krishnamurty, Brookfield, CT (US);
Maotang X. Zhou, Jamesville, NY (US);
Purushotham Vemishetti, East Syracuse, NY (US);
Yadagiri R. Pendri, South Glastonbury, CT (US);
Chung-Pin H. Chen, Madison, CT (US);
Sunil S. Patel, Fords, NJ (US);
Jeffrey M. Evans, Manlius, NY (US);
Jing Liang, Princeton, NJ (US);
David R. Kronenthal, Yardley, PA (US);
Gerald L. Powers, North Brunswick, NJ (US);
Siva Josyula Prasad, Kendall Park, NJ (US);
Jeffrey T. Bien, Princeton, NJ (US);
Zhongping Shi, West Windsor, NJ (US);
Ramesh N. Patel, Bridgewater, NJ (US);
Amit Banerjee, St. Louis, MO (US);
Yeung Yu Chan, Kendall Park, NJ (US);
Sushil K. Rijhwani, Robbinsville, NJ (US);
Ambarish K. Singh, Bordentown, NJ (US);
Shaopeng Wang, King of Prussia, PA (US);
Milan Stojanovic, Fort Lee, NJ (US);
David J. Kucera, Del Mar, CA (US);
Richard P. Polniaszek, Redwood City, CA (US);
Charles Lewis, Fairfield, NJ (US);
John Thottathil, Ivanhoe, IL (US);
Dhileepkumar Krishnamurty, Brookfield, CT (US);
Maotang X. Zhou, Jamesville, NY (US);
Purushotham Vemishetti, East Syracuse, NY (US);
Bristol-Myers Squibb Company, Princeton, NJ (US);
Abstract
Processes are disclosed for preparing the antiviral agent entecavir. A resin adsorption process for the isolation and purification of entecavir is also disclosed. Various intermediates useful in the preparation of entecavir are also disclosed.