The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 25, 2006

Filed:

Jul. 15, 2003
Applicants:

Dirk Emiel Paula Mestach, Nijlen, BE;

Richard Hendrikus Gerrit Brinkhuis, Zwolle, NL;

Petrus Johannes Maria David Elfrink, Boxmeer, NL;

Assignee:

Nuplex Resins, B.V., Bergen Op Zoom, NL;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08F 8/18 (2006.01);
U.S. Cl.
CPC ...
Abstract

The invention pertains to a method for making a block or gradient final (co)polymer comprising a step of radically polymerizing a mixture of ethylenically unsaturated monomers in the presence of a) a radical precursor and b) an iodine atom-containing intermediate polymer or a mixture of iodine atom-containing intermediate polymers, wherein the iodine atom-containing intermediate polymer comprises at least 50 mole % of methacrylate monomers and is obtainable from a polymerization of ethylenically unsaturated monomers.


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