The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 7033868 B1

PDF
Full Text
Expired
Date of Patent:
Apr. 25, 2006

Filed:

Mar. 25, 2004
Applicants:

Shunji Nakamura, Kawasaki, JP;

Yosuke Shimamune, Kawasaki, JP;

Inventors:

Shunji Nakamura, Kawasaki, JP;

Yosuke Shimamune, Kawasaki, JP;

Assignee:

Fujitsu Limited, Kawasaki, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/84 (2006.01); H01L 21/76 (2006.01); H01L 21/46 (2006.01);
U.S. Cl.
CPC ...
Abstract

A high-speed, low-power-consumption semiconductor device has a thin-film Si layer with a source/drain formed therein. The thin-film Si layer is curved from a region directly below a gate electrode toward a region near the source/drain. The curved thin-film Si layer develops strains in a channel region disposed directly below the gate electrode sandwiched by the source/drain in the thin-film Si layer, for thereby increasing a carrier mobility. A cavity is defined below the curved thin-film Si layer for reducing a parasitic capacitance due to a pn junction.


Find Patent Forward Citations

Nakamura, Shunji. (2006). Semiconductor device and method of manufacturing same (U.S. Patent No. 7033868). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/7033868

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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