The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 25, 2006
Filed:
Jan. 20, 2004
Applicants:
Shinichi Yotsuya, Chino, JP;
Takayuki Kuwahara, Suwa, JP;
Inventors:
Shinichi Yotsuya, Chino, JP;
Takayuki Kuwahara, Suwa, JP;
Assignee:
Seiko Epson Corporation, , JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B32B 3/24 (2006.01);
U.S. Cl.
CPC ...
Abstract
A precision mask for deposition is provided that includes a first brace having a plurlaity of sections placed in parallel to each other at given intervals. The first brace forms portions that define a plurality of first openings. The precision mask for deposition also includes at least one second brace that is placed on the first brace so as to intersect with the first brace. The second brace forms portions that define a plurality of second openings. The second brace is joined to the first brace at a point where the second brace intersects with the first brace.