The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 7033646 B1

PDF
Full Text
Expired
Date of Patent:
Apr. 25, 2006

Filed:

Jul. 24, 2003
Applicant:

Chi Zhang, Goleta, CA (US);

Inventor:

Chi Zhang, Goleta, CA (US);

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08F 2/56 (2006.01); C08F 228/00 (2006.01); C08J 7/18 (2006.01); C08G 73/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

Compositions are provided comprising polyaniline (PANI) with poly(2-acrylamido-2-methyl-1-propanesulfonic acid) (PAAMPSA) as the counterion (PANI/PAAMPSA) and an amount of poly(styrenesulfonic acid) (PSS) sufficient to reduce the conductivity of the composition relative to PANI/PAAMPSA. Invention compositions may further comprise poly(acrylamide) (PAM). Invention compositions are useful as high resistance buffer layers for use in electroluminescent devices (such as, organic light emitting diodes (OLEDs)).


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Zhang, Chi. (2006). High resistance polyaniline blend for use in high efficiency pixellated polymer electroluminescent devices (U.S. Patent No. 7033646). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/7033646

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