The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 25, 2006

Filed:

Apr. 02, 2003
Applicants:

Matthew M. Ply, Fenton, MI (US);

Steven M. Kline, Linden, MI (US);

Inventors:

Matthew M. Ply, Fenton, MI (US);

Steven M. Kline, Linden, MI (US);

Assignee:

General Motors Corporation, Detroit, MI (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B60D 20/00 (2006.01); G05G 5/00 (2006.01); G05G 1/04 (2006.01);
U.S. Cl.
CPC ...
Abstract

A two-stage, bi-directional shift lever vibration isolator. A shift lever has a sleeve whereinside is a lever vibration isolator which includes a damping body having an axial bore and an outer surface characterized by an hour-glass cross-section composed of convex and concave surfaces; a transmission shift shaft attachment housing located in the bore; an upper washer connected to the housing and abutting an upper end of the damping body; and a lower washer connected to the housing and abutting a lower end of the damping body. The upper and lower washers are sized to provide a predetermined perimeter separation with respect to the sleeve. The hour-glass cross-section of the damping body provides bi-directional natural frequency of vibration and stiffness. The perimeter clearance of the washers provides a two-stage stiffness determined by when the damping body has undergone sufficient shear force that one or both of the upper and lower washers contact the sleeve, whereupon stiffness in the direction of the applied force is very high.


Find Patent Forward Citations

Loading…