The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 7031508 B1

PDF
Full Text
Expired
Date of Patent:
Apr. 18, 2006

Filed:

Jun. 24, 2003
Applicants:

John L. Lawless, Pacifica, CA (US);

Albert E. Chu, Hillsborough, CA (US);

Inventors:

John L. Lawless, Pacifica, CA (US);

Albert E. Chu, Hillsborough, CA (US);

Assignee:

E Y Laboratories, Inc., San Mateo, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06K 9/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

A self-contained system uses light reflectivity to examine intensity of a dyed spot on a device membrane surrounded by background area to discern information about the specimen that produced the spot. In a preferred embodiment, a master clock alternatively drives one LED focussed upon the spot center, and then drives two LEDS focused on the background area. Light reflected from the spot and background is detected by preferably two photodetectors ('PDs') spaced-apart a multiple of 90° azimuthal.


Find Patent Forward Citations

Lawless, John. (2006). Reflectometry system with compensation for specimen holder topography and with lock-rejection of system noise (U.S. Patent No. 7031508). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/7031508

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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