The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 18, 2006

Filed:

Apr. 09, 2002
Applicants:

Andrew Tye Hunt, Atlanta, GA (US);

Miodrag Oljaca, Avondale Estates, GA (US);

Scott Flanagan, Atlanta, GA (US);

Girish Deshpande, Norcross, GA (US);

Stein Lee, Atlanta, GA (US);

Peter W. Faguy, Suwanee, GA (US);

Inventors:

Andrew Tye Hunt, Atlanta, GA (US);

Miodrag Oljaca, Avondale Estates, GA (US);

Scott Flanagan, Atlanta, GA (US);

Girish Deshpande, Norcross, GA (US);

Stein Lee, Atlanta, GA (US);

Peter W. Faguy, Suwanee, GA (US);

Assignee:

nGimat Co., Atlanta, GA (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H01G 5/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

Tunable capacitors () have a dielectric material () between electrodes, which dielectric material comprises an insulating material () and electrically conductive material, () e.g., conductive nanoparticulates, dispersed therein. In certain cases, enhanced tune-ability is achieved when the dielectric material comprises elongated nanoparticulates (). Further enhanced tune-ability may be achieved by aligning elongated particulates in an electrode-to-electrode direction. Nanoparticulates may be produced by heating passivated nanoparticulates. Passivated nanoparticulates may be covalently bound within a polymeric matrix. High bias potential device structures can be formed with preferential mobilities.


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