The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 18, 2006
Filed:
Sep. 25, 2003
Kazuya Kitamura, Tenri, JP;
Yukio Kurata, Tenri, JP;
Yoshihiro Sekimoto, Kyoto, JP;
Kuniaki Okada, Tenri, JP;
Noboru Fujita, Nara, JP;
Yukiko Nagasaka, Tenri, JP;
Hiroshi Nakanishi, Yawata, JP;
Kazuya Kitamura, Tenri, JP;
Yukio Kurata, Tenri, JP;
Yoshihiro Sekimoto, Kyoto, JP;
Kuniaki Okada, Tenri, JP;
Noboru Fujita, Nara, JP;
Yukiko Nagasaka, Tenri, JP;
Hiroshi Nakanishi, Yawata, JP;
Sharp Kabushiki Kaisha, Osaka, JP;
Abstract
An object of the invention is to provide a method of manufacturing a microlens array and a projection-type liquid crystal display apparatus which can increase the efficiency of use of light, facilitate a method of manufacturing a microlens array and reduce the cost of equipment. By an operation of only irradiating a first lens with parallel light which has an intensity distribution corresponding to the shape of a second lens and irradiating an ultraviolet curing resin layer with transmission light, the first and second lenses are placed with a high alignment accuracy in a mutual positional relation thereof. By irradiating the first lens with the parallel light, it becomes possible to uniformly expose a broad area, and it becomes possible to expose by the wafer.