The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 18, 2006
Filed:
Nov. 20, 2000
Koji Suzuki, Chiba, JP;
Koji Suzuki, Chiba, JP;
Kawasaki Microelectronics, Inc., Chiba, JP;
Abstract
A multi-layered film on a semiconductor substrate is etched with a multi-step etching process by sequentially providing a plurality of process gases having different compositions in a chamber. A plasma discharge to excite the process gases is continued without an interruption during a switch to a different process gas. A relationship between different process gases desirable for the continuous plasma excitation is also disclosed. An apparatus suitable to practice this continuous plasma excitation process includes a process gas supply system having a gas reservoir. A mixture of at least two component gases is prepared and reserved in the reservoir, and is supplied to the etching chamber when it is needed.
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