The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 18, 2006
Filed:
Jun. 09, 2004
Applicants:
Michael A. Todd, Phoenix, AZ (US);
Paul D. Brabant, Phoenix, AZ (US);
Keith D. Weeks, Mesa, AZ (US);
Jianqing Wen, Singapore, SG;
Inventors:
Michael A. Todd, Phoenix, AZ (US);
Paul D. Brabant, Phoenix, AZ (US);
Keith D. Weeks, Mesa, AZ (US);
Jianqing Wen, Singapore, SG;
Assignee:
ASM America, Inc., Phoenix, AZ (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/20 (2006.01);
U.S. Cl.
CPC ...
Abstract
Methods for forming epitaxial films involve forming a buffer layer on a single crystal substrate, depositing an amorphous layer on the buffer layer, then forming an epitaxial film from the amorphous layer by solid phase epitaxy.
Todd, Michael. (2006). Methods for depositing amorphous materials and using them as templates for epitaxial films by solid phase epitaxy (U.S. Patent No. 7029995). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/7029995
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile