The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 18, 2006

Filed:

Dec. 30, 2003
Applicants:

Katrina A. Mikhaylich, San Jose, CA (US);

Mike Ravkin, Sunnyvale, CA (US);

Yehiel Gotkis, Fremont, CA (US);

Inventors:

Katrina A. Mikhaylich, San Jose, CA (US);

Mike Ravkin, Sunnyvale, CA (US);

Yehiel Gotkis, Fremont, CA (US);

Assignee:

Lam Research Corporation, Fremont, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B24B 7/22 (2006.01); B24B 49/14 (2006.01);
U.S. Cl.
CPC ...
Abstract

An apparatus is provided for polishing a substrate. The apparatus includes a polishing pad configured to traverse from at least a first point to a second point. A first sensor is located near the first point and oriented so as to sense an incoming temperature of the polishing pad. A second sensor is located near the second point and oriented so as to sense an outgoing temperature of the polishing pad. A difference between the incoming temperature and the outgoing temperature is then used to determine endpoint of a polishing operation.


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