The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 11, 2006

Filed:

Feb. 13, 2002
Applicant:

Don Odell, Milton, VT (US);

Inventor:

Don Odell, Milton, VT (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G06K 9/00 (2006.01); G01N 21/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

A patterned mask is located at a distance from a linear detector array. A point radiating source illuminates the aperture to cast an image onto the array. A computer is employed to identify frequencies in the frequency domain to determine the image scale and shift along the detector array axis. Determination of the magnification of the aperture image is made employing frequency domain techniques, the aperture pattern being re-scaled to match that of the actual image, so that determination of pattern shift can be made. A first embodiment of the present invention has two variations, one of which employs the use of multiple single frequency components and phase methodology, the second of which uses multiple single frequency components as well as a variable frequency component. In a second embodiment, a composite image is also used except that only one single frequency component is used in addition to a non-periodic function.


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