The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 11, 2006
Filed:
Aug. 01, 2005
Hiroshi Kurosawa, Chiba, JP;
Hiroshi Kurosawa, Chiba, JP;
Canon Kabushiki Kaisha, Tokyo, JP;
Abstract
A scanning exposure apparatus for exposing a substrate to a pattern of a reticle. The apparatus includes an exposure system which exposes the substrate to the pattern with respect to a unit region, to which the pattern is transferred, of the substrate, by relatively moving the reticle and the substrate, a control system which controls an operation of the exposure system, the control system determining whether a condition of an exposure performed by the exposure system is within a tolerance during the exposure, and causing the exposure system to continue exposing a remaining region in the unit region of the substrate to the pattern, even after the control system determines that the condition is out of the tolerance for the unit region, and a user interface system which indicates information for identifying the unit region, for which the control system determines that the condition is out of the tolerance, of the substrate.