The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 11, 2006
Filed:
Nov. 14, 2001
Toshiyuki Ueda, Kudamatsu, JP;
Naomi Yabuta, Kudamatsu, JP;
Shinichi Aoki, Kudamatsu, JP;
Toyo Kohan Co., Ltd., Tokyo, JP;
Abstract
A material for a shadow mask, characterized in that it has a chemical composition: C=0.0030 wt %, Si=0.03 wt %, Mn: 0.1 to 0.5 wt %, P=0.02 wt %, S=0.02 wt %, Al: 0.01 to 0.07 wt %, N=0.0030 wt %, B: an amount satisfying 0.5≦B/N≦2, and balance: Fe and inevitable impurities, and can form a shadow mask having a coercive force Hc of 90 A/m or less; and a method for producing the material, characterized in that use is made of a raw material having the above chemical composition, the finishing temperature in hot rolling is lower than Ar3 point by O to 30° C., the coiling temperature is 650 to 700° C., and the rolling reduction percentage in the final rolling (secondary cold rolling) is 30 to 45%. The material produced by the method exhibits magnetic characteristics being uniform in a coil and excellent as described above.