The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 11, 2006
Filed:
May. 09, 2005
Yasuhide Kawaguchi, Yokohama, JP;
Shinji Okada, Yokohama, JP;
Yoko Takebe, Yokohama, JP;
Osamu Yokokoji, Yokohama, JP;
Isamu Kaneko, Yokohama, JP;
Yasuhide Kawaguchi, Yokohama, JP;
Shinji Okada, Yokohama, JP;
Yoko Takebe, Yokohama, JP;
Osamu Yokokoji, Yokohama, JP;
Isamu Kaneko, Yokohama, JP;
Asahi Glass Company, Limited, Tokyo, JP;
Abstract
To provide a fluoropolymer suitable for use as a base polymer for resist materials for excimer lasers having a wavelength of 250 nm or shorter. A fluoropolymer having a monomer unit formed by cyclopolymerization of a fluorinated diene compound represented by the following formula (3),CF═CFCF—C(CF)(R)—CHCH═CH  (3)wherein Ris either a hydroxyl group blocked by —CHR—O—Ror an organic group having the hydroxyl group, and Ris a cyclic saturated hydrocarbon such as a cycloalkyl group which may have a substituent, or an organic group having the cyclic saturated hydrocarbon.