The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 11, 2006
Filed:
Jul. 30, 2001
Peter Trefonas, Iii, Medway, MA (US);
Manuel Docanto, Stoughton, MA (US);
Edward K. Pavelchek, Stow, MA (US);
Peter Trefonas, III, Medway, MA (US);
Manuel doCanto, Stoughton, MA (US);
Edward K. Pavelchek, Stow, MA (US);
Shipley Company, LLC, Marlborough, MA (US);
Abstract
Antireflective compositions are provided that contain a basic additive material. Such use of a basic material can significantly decrease or even completely eliminate notching of an overcoated photoresist relief image. Antireflective formulations of the invention are preferably crosslinking compositions and may contain a resin component in addition to the basic additive. Antireflective compositions of the invention can be effectively used at a variety of wavelengths used to expose an overcoated photoresist layer, including 248 nm and 193 nm.