The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 11, 2006
Filed:
May. 15, 2002
Xiao-dong Zhou, Rolla, MO (US);
Wayne Huebner, Rolla, MO (US);
Harlan U. Anderson, Rolla, MO (US);
The Curators of the University of Missouri, Columbia, MO (US);
Abstract
The invention comprises novel undoped and doped nanometer-scale CeOparticles as well as a novel semi-batch reactor method for directly synthesizing the novel particles at room temperature. The powders exhibited a surface area of approximately 170 m/g with a particle size of about 3–5 nm, and are formed of single crystal particles that are of uniform size and shape. The particles' surface area could be decreased down to 5 m/g, which corresponds to a particle size of 100 nm, by thermal annealing at temperatures up to 1000° C. Control over the particle size, size distribution and state of agglomeration could be achieved through variation of the mixing conditions such as the feeding method, stirrer rate, amount of Ogas that is bubbled through the reactor, the temperature the reaction is carried out at, as well as heating the final product at temperatures ranging from 150° to 1000° C.