The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 11, 2006
Filed:
Feb. 02, 2001
Gary S. Selwyn, Los Alamos, NM (US);
Ivars Henins, Los Alamos, NM (US);
Jaeyoung Park, Los Alamos, NM (US);
Hans W. Herrmann, Los Alamos, NM (US);
Gary S. Selwyn, Los Alamos, NM (US);
Ivars Henins, Los Alamos, NM (US);
Jaeyoung Park, Los Alamos, NM (US);
Hans W. Herrmann, Los Alamos, NM (US);
The Regents of the University of California, Los Alamos, NM (US);
Abstract
Apparatus for the processing of materials involving placing a material either placed between an radio-frequency electrode and a ground electrode, or which is itself one of the electrodes. This is done in atmospheric pressure conditions. The apparatus effectively etches or cleans substrates, such as silicon wafers, or provides cleaning of spools and drums, and uses a gas containing an inert gas and a chemically reactive gas.