The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 11, 2006
Filed:
Jul. 05, 2002
Peter Bossard, Ivyland, PA (US);
Paul D. Bossard, Ivyland, PA (US);
Peter Bossard, Ivyland, PA (US);
Paul D. Bossard, Ivyland, PA (US);
Power & Energy, Inc., Ivyland, PA (US);
Abstract
A hydrogen diffusion cell that is used to purify contaminated hydrogen gas. The hydrogen diffusion cell has at least one hydrogen diffusion structure that separates a first area from a second area. Normally, the pressure in the first area is kept higher than the pressure in the second area. This causes a pressure differential that causes hydrogen gas to permeate from the first area to the second area. However, an extreme pressure differential can occur when the second area is at its maximum pressure and the first area is inadvertently vented to ambient pressure. Under this extreme pressure differential hydrogen gas permeates from the second area back into the first area at a maximum reverse flow rate. A flow restrictor is provided that limits the flow of gas exiting the first area to a flow rate no greater than the maximum reverse flow rate.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile