The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 11, 2006
Filed:
Nov. 21, 2003
Hirotsugu Komiya, Kanagawa, JP;
Sumihisa Yamaguchi, Kanagawa, JP;
Tetsufumi Hisatsune, Kanagawa, JP;
Atsuyoshi Takenaka, Kanagawa, JP;
Shigeaki Yonemori, Kanagawa, JP;
Hirotsugu Komiya, Kanagawa, JP;
Sumihisa Yamaguchi, Kanagawa, JP;
Tetsufumi Hisatsune, Kanagawa, JP;
Atsuyoshi Takenaka, Kanagawa, JP;
Shigeaki Yonemori, Kanagawa, JP;
Seimi Chemical Co., Ltd., Chigasaki, JP;
Abstract
A method for evaluating the quality of abrasive grains for polishing glass, which comprises adding abrasive grains to be measured, to an aqueous medium having silica dissolved therein, to have the silica adsorbed on the abrasive grains under such a condition that the silica undergoes substantially no polymerization in the aqueous medium, followed by solid-liquid separation to separate the abrasive grains from the mother liquor, and measuring the concentration of silica remaining in the mother liquor to measure the adsorption rate (η) of silica on the abrasive grains.