The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 04, 2006
Filed:
Dec. 17, 2004
Roman Malendevich, Oceanside, CA (US);
Myles Sussman, San Mateo, CA (US);
Lawrence C. Gunn, Iii, Encinitas, CA (US);
Roman Malendevich, Oceanside, CA (US);
Myles Sussman, San Mateo, CA (US);
Lawrence C. Gunn, III, Encinitas, CA (US);
Luxtera, Inc., Carlsbad, CA (US);
Abstract
This application describes, among others, wafer designs, testing systems and techniques for wafer-level optical and optoelectronic testing by coupling probe light to/from the top of the wafer. In the described exemplary implementations, wafers are designed with one or more optical alignment features or structures. The alignment structures are alongside the devices to be tested, but are easier to find or locate by optical means, than the devices to be tested. An optical diffraction grating structure such as a Littrow grating may be used as reflective alignment structures. (FIG.B and paragraph 56.) A Littrow grating as an alignment structure produces a retro-reflection. A Littrow grating is a one-port optical device, with input and output beams going along the same path. Various exemplary implementations are shown in FIGS.C,A,B,A andB and described in paragraphs 18–21, 39–40 and 53–64.