The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 04, 2006
Filed:
Jul. 05, 2001
Yonglin Huang, Milpitas, CA (US);
Liren Du, Sunnyvale, CA (US);
Meng MA, San Jose, CA (US);
Shuyun Huang, Santa Clara, CA (US);
Yonglin Huang, Milpitas, CA (US);
Liren Du, Sunnyvale, CA (US);
Meng Ma, San Jose, CA (US);
Shuyun Huang, Santa Clara, CA (US);
Finisar Corporation, Sunnyvale, CA (US);
Abstract
An optical isolator includes a first stage configured to refract a light ray applied in a forward direction into a first ray and a second ray. A second stage rotated 90° with respect to the first is configured to refract said first and second rays in a substantially parallel manner. The isolator is configured such that the first ray comprises an e-ray with respect to the first stage and an o-ray with respect to the second stage, and the second ray comprises an o-ray with respect to the first stage and an e-ray with respect to the second stage, thereby substantially reducing the effects of polarization mode dispersion.