The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 04, 2006
Filed:
Mar. 17, 2004
Yung-hsin Chen, Hsinchu, TW;
Wann-ding Tyan, Hsinchu, TW;
Pong Lai, Hsinchu, TW;
Ying-tsung LU, Hsinchu, TW;
Yung-Hsin Chen, Hsinchu, TW;
Wann-Ding Tyan, Hsinchu, TW;
Pong Lai, Hsinchu, TW;
Ying-Tsung Lu, Hsinchu, TW;
Industrial Technology Research Institute, Hsinchu, TW;
Abstract
An apparatus for forming a nano grating device to film nano-scale interference fringes by holography in order to makes a nano-scale meshed structure is disclosed. A beam emitted form a light source passes subsequently through a beam splitter and two reflectors to reach at symmetrically mounted light emitting modules. The light emitting modules generate two beams passing along the same optical paths and then projecting on a photosensitive substrate that is attached on a hemi-sphere lens. Thus, a first set of interference fringes are formed. Then, the substrate rotates with an angle and then is subjected to exposure to form a second set of interference fringes crossing the first set of interference fringes. Thereby, a nano-scale meshed structure is obtained.