The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 04, 2006
Filed:
Mar. 08, 2004
Guanghua G. Zhang, San Jose, CA (US);
Dale H. Buermann, Los Altos, CA (US);
Michael J. Mandella, Palo Alto, CA (US);
Hector H. Gonzalez-banos, Mountain View, CA (US);
Stewart R. Carl, Palo Alto, CA (US);
Guanghua G. Zhang, San Jose, CA (US);
Dale H. Buermann, Los Altos, CA (US);
Michael J. Mandella, Palo Alto, CA (US);
Hector H. Gonzalez-Banos, Mountain View, CA (US);
Stewart R. Carl, Palo Alto, CA (US);
Electronic Scripting Products, Inc., Palo Alto, CA (US);
Abstract
An apparatus and method employing principles of stereo vision for determining one or more orientation parameters and especially the second and third Euler angles θ, ψ of an elongate object whose tip is contacting a surface at a contact point. The apparatus has a projector mounted on the elongate object for illuminating the surface with a probe radiation in a known pattern from a first point of view and a detector mounted on the elongate object for detecting a scattered portion of the probe radiation returning from the surface to the elongate object from a second point of view. The orientation parameters are determined from a difference between the projected and detected probe radiation such as the difference between the shape of the feature produced by the projected probe radiation and the shape of the feature detected by the detector. The pattern of probe radiation is chosen to provide information for determination of the one or more orientation parameters and can include asymmetric patterns such as lines, ellipses, rectangles, polygons or the symmetric cases including circles, squares and regular polygons. To produce the patterns the projector can use a scanning arrangement or a structured light optic such as a holographic, diffractive, refractive or reflective element and any combinations thereof. The apparatus is suitable for determining the orientation of a jotting implement such as a pen, pencil or stylus.