The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 04, 2006
Filed:
Aug. 18, 2004
Masashi Tanaka, Yokohama, JP;
Masato Kumazawa, Kawasaki, JP;
Kinya Kato, Yokohama, JP;
Masaki Kato, Yokohama, JP;
Hiroshi Chiba, Yokohama, JP;
Hiroshi Shirasu, Yokohama, JP;
Masashi Tanaka, Yokohama, JP;
Masato Kumazawa, Kawasaki, JP;
Kinya Kato, Yokohama, JP;
Masaki Kato, Yokohama, JP;
Hiroshi Chiba, Yokohama, JP;
Hiroshi Shirasu, Yokohama, JP;
Nikon Corporation, Tokyo, JP;
Abstract
A scanning projection exposure apparatus transfers a pattern of a mask onto a photosensitive substrate while moving the photosensitive substrate along a scanning direction. The scanning projection exposure apparatus can include an illumination optical system optically connected to a light source, and a projection optical system arranged in an optical path between the mask and the substrate. The illumination optical system illuminates the mask with linearly polarized light whose polarization direction extends along one of the scanning direction and a direction perpendicular to the scanning direction, without losses in quantity of light. The illumination optical system of the scanning projection exposure apparatus also can include a wave plate which is rotatable about a traveling direction of the light.