The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 04, 2006
Filed:
Nov. 21, 2003
Geun Su Lee, Gyeonggi-do, KR;
Cheol Kyu Bok, Seoul, KR;
Seung Chan Moon, Gyeonggi-do, KR;
Ki Soo Shin, Gyeonggi-do, KR;
Jae Hyun Kim, Gyeonggi-do, KR;
Jung Woo Kim, Gyeonggi-do, KR;
Sang Hyang Lee, Gyeonggi-do, KR;
Jae Hyun Kang, Gyeonggi-do, KR;
Geun Su Lee, Gyeonggi-do, KR;
Cheol Kyu Bok, Seoul, KR;
Seung Chan Moon, Gyeonggi-do, KR;
Ki Soo Shin, Gyeonggi-do, KR;
Jae Hyun Kim, Gyeonggi-do, KR;
Jung Woo Kim, Gyeonggi-do, KR;
Sang Hyang Lee, Gyeonggi-do, KR;
Jae Hyun Kang, Gyeonggi-do, KR;
Hynix Semiconductor Inc., Gyeonggi-Do, KR;
Dongjin Semichem Co., Ltd., Incheon, KR;
Abstract
Photoresist polymers and photoresist compositions are disclosed. A photoresist polymer represented by Formula 1 and a photoresist composition containing the same have excellent etching resistance, thermal resistance and adhesive property, and high affinity to an developing solution, thereby improving LER (line edge roughness).