The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 04, 2006
Filed:
Nov. 28, 2001
Koji Furuya, Kanagawa, JP;
Hiroshi Kusume, Kanagawa, JP;
Makoto Handa, Kanagawa, JP;
Teijin Limited, Osaka, JP;
Abstract
A film which is a biaxially oriented film comprising polyethylene-2,6-naphthalenedicaboxylate as a principal component, having a thermal strain ratio RMD (150) in the machine direction of the film at a temperature of 150° C. is −1.5%≦RMD (150)≦0.0% when the thermal strain ratio RMD (T) in the machine direction of the film at a temperature T° C. based on the length LMD (t) in the machine direction (MD) of the film at a temperature t° C. is defined by()={[()−(35)]/(35)}×100(%),excellent in insulation characteristics without lowering processing characteristics, especially the characteristics during hot-pressing and suitable as a dielectric for capacitors.