The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 04, 2006
Filed:
May. 24, 2004
Applicants:
Pietro Bilardello, Vanves, FR;
Nicolas Durupt, Limoges, FR;
Renaud Pontier, Luzinay, FR;
Inventors:
Assignee:
Compagnie Generale des Matieres Nucleaires, Velizy-Villcoublay, FR;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B01J 19/24 (2006.01); B01J 19/00 (2006.01); B01D 53/00 (2006.01);
U.S. Cl.
CPC ...
Abstract
A gas siphon type reactor () is used to carry out a three phase chemical reaction under pressure, such as the reduction of uranyl nitrate to uranous nitrate by hydrogen, in the presence of a catalyst made up of platinum on a silica carrier. The control of the pressure in the reactor () is provided by regulating the liquid and gas flow rates from separator (), into which the liquid and the gas leaving the reactor () are routed. The liquid in the reactor () is tapped from a lateral branch pipe () fitted with a filter () and emerging in the upper area (), behind a profiled wall ().