The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 04, 2006

Filed:

Nov. 26, 2003
Applicants:

Pierre Bouchaïb, Carrières-sur-Seine, FR;

Franck Stemmelen, Jouy-le-Moutier, FR;

Inventors:

Pierre Bouchaïb, Carrières-sur-Seine, FR;

Franck Stemmelen, Jouy-le-Moutier, FR;

Assignee:

Addon, , FR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 14/54 (2006.01); C23C 14/24 (2006.01);
U.S. Cl.
CPC ...
Abstract

Epitaxy equipment including an epitaxy chamber under vacuum containing a substrate support and at least one cell under vacuum for evaporation of epitaxy material closed by a diaphragm having at least one opening and communicating with the epitaxy chamber by a connecting flange, and a mobile plate positioned opposite the diaphragm such that the distance of the plate from an exterior surface of the diaphragm is variable and has a section corresponding to a section of the diaphragm and a molecular beam is formed at the level of a zone surrounding the plate.


Find Patent Forward Citations

Bouchaïb, Pierre. (2006). Molecular beam epitaxy equipment (U.S. Patent No. 7021238). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/7021238

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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