The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 28, 2006
Filed:
Jul. 18, 2003
Yi Yeol Lyu, Daejun-Shi, KR;
Jin Heong Yim, Daejun-Shi, KR;
Sang Kook Mah, Seoul, KR;
Eun Ju Nah, Daejun-Shi, KR;
IL Sun Hwang, Daejun-Shi, KR;
Hyun Dam Jeong, Suwon-Shi, KR;
Jung Hyung Kim, Daejun-Shi, KR;
Yi Yeol Lyu, Daejun-Shi, KR;
Jin Heong Yim, Daejun-Shi, KR;
Sang Kook Mah, Seoul, KR;
Eun Ju Nah, Daejun-Shi, KR;
Il Sun Hwang, Daejun-Shi, KR;
Hyun Dam Jeong, Suwon-Shi, KR;
Jung Hyung Kim, Daejun-Shi, KR;
Samsung Electronics Co., Ltd., Kyungki-Do, KR;
Abstract
Disclosed herein are siloxane-based resins prepared by hydrolyzing and polycondensing cyclic and/or cage-shape siloxane compounds, optionally with at least one silane compound, in an organic solvent in the presence of a catalyst and water. Also, disclosed herein are methods for forming insulating film between interconnect layers in semiconductor devices by using the siloxane-based resins thus prepared as low dielectric insulating materials.