The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 28, 2006

Filed:

Oct. 18, 2002
Applicants:

Ying Hung SO, Midland, MI (US);

Keith J. Watson, Midland, MI (US);

Scott J. Bis, Midland, MI (US);

Inventors:

Ying Hung So, Midland, MI (US);

Keith J. Watson, Midland, MI (US);

Scott J. Bis, Midland, MI (US);

Assignee:

Dow Global Technologies Inc., Midland, MI (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08F 10/00 (2006.01); G03F 7/023 (2006.01); C08L 45/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

The invention is a photoswitchable benzocyclobutene-based polymer that while remaining aqueous developable, avoids the problem of significant moisture uptake. The oligomer or polymer comprises a polymeric backbone, benzocyclobutene reactive groups, and photoswitchable pendant groups. The pendant groups are bonded to the polymeric backbone and are characterized by the presence of a moiety that converts to carboxylic acid upon exposure to activating wavelengths of radiation a carboxylic acid. When the oligomer or polymer is subsequently heated to cause cure of the oligomer or polymer, carbon dioxide is emitted and the group forms a substantially non-polar moiety. The invention is also a method of making such a polymer and a method of forming a patterned film using such a polymer.


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