The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 28, 2006
Filed:
Jul. 15, 2003
Kui Yao, Singapore, SG;
Xujiang He, Singapore, SG;
Jian Zhang, Singapore, SG;
Santiranjan Shannigrahi, Singapore, SG;
Kui Yao, Singapore, SG;
Xujiang He, Singapore, SG;
Jian Zhang, Singapore, SG;
Santiranjan Shannigrahi, Singapore, SG;
Agency for Science, Technology and Research, Singapore Science Park II, SG;
Abstract
A method for fabricating a MEMS device comprises providing a substrate having a back side, a front side opposite to the back side and a periphery portion. A desired microstructure is formed on the back side of the substrate. The substrate is then supported for rotation. A precursor solution is deposited on the front side of the substrate during rotation so that a thin film layer may be formed thereon. During formation of the thin film layer, the substrate is supported and rotated that the microstructure formed on the back side is protected.