The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 28, 2006

Filed:

Apr. 09, 2003
Applicants:

Young C. Ko, Neenah, WI (US);

Kambiz B. Makoui, Neenah, WI (US);

Richard H. Thiessen, Appleton, WI (US);

Jason M. Laumer, Appleton, WI (US);

Inventors:

Young C. Ko, Neenah, WI (US);

Kambiz B. Makoui, Neenah, WI (US);

Richard H. Thiessen, Appleton, WI (US);

Jason M. Laumer, Appleton, WI (US);

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B05D 1/36 (2006.01);
U.S. Cl.
CPC ...
Abstract

A method of making an absorbent structure having high integrity is provided. A first superabsorbent polymer precursor composition including a monomer, a crosslinking agent and a reducing agent, and a second superabsorbent polymer precursor composition including a monomer, a crosslinking agent and an oxidizing agent are combined at a plurality of discrete, spaced-apart locations on or in a substrate. The precursor compositions react with each other to form discrete, spaced-apart microdomains of superabsorbent polymer adhering to the substrate. The spacing is sufficient to avoid gel blocking when the microdomains swell due to liquid absorption. The adhesion to the substrate is sufficient to maintain spacings between the microdomains of superabsorbent polymer.


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