The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 21, 2006

Filed:

Jun. 14, 2002
Applicants:

Daniele Sirtori, Milan, IT;

Matteo Maravita, Pavia, IT;

Inventors:

Daniele Sirtori, Milan, IT;

Matteo Maravita, Pavia, IT;

Assignee:

STMicroelectronics S.r.l., Agrate Brianza, IT;

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H04N 7/01 (2006.01);
U.S. Cl.
CPC ...
Abstract

The conversion into a progressive format of digital images organized in half-frames or fields with interlaced lines or rows envisages selecting successive lines in one or more of said fields and reconstructing by pixels an image line set between the interlaced lines selected. The reconstruction operation obtains the image by creating a set of candidate patterns associated to the work window by selecting the patterns to be considered within the window. Next, applying to the patterns of the aforesaid set a first cost function which is representative of the correlations between pairs of pixels. Applying to the patterns of the aforesaid set a second cost function which is representative of the non-correlations between pairs of pixels. Selecting, for each candidate pattern, respective internal correlations and external non-correlations, calculating corresponding scores for the candidate patterns using the aforesaid first cost function. Selecting a best pattern by comparing the respective scores of the candidate patterns with at least one threshold; and selecting the pixels of the window identified by the best pattern selected, then reconstructing the missing line by filtration starting from said pixels.


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