The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 21, 2006
Filed:
Jun. 21, 2004
Russell H. Arndt, Fishkill, NY (US);
Kenneth J. Giewont, Hopewell Junction, NY (US);
Kevin E. Mello, Fishkill, NY (US);
M. Dean Sciacca, Poughkeepsie, NY (US);
Russell H. Arndt, Fishkill, NY (US);
Kenneth J. Giewont, Hopewell Junction, NY (US);
Kevin E. Mello, Fishkill, NY (US);
M. Dean Sciacca, Poughkeepsie, NY (US);
International Business Machines Corporation, Armonk, NY (US);
Abstract
Methods for selective salicidation of a semiconductor device. The invention implements a chemical surface pretreatment by immersion in ozonated water HO prior to metal deposition. The pretreatment forms an interfacial layer that prevents salicidation over an n-type structure. As a result, the invention does not add any additional process steps to the conventional salicidation processing.