The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 21, 2006
Filed:
May. 23, 2001
James F. Groves, Charlottesville, VA (US);
Derek D. Hass, Charlottesville, VA (US);
Haydn N. G. Wadley, Keswick, VA (US);
Goesta Mattausch, Dresden, DE;
Henry Morgner, Dresden, DE;
Siegfried Schiller, Dresden, DE;
James F. Groves, Charlottesville, VA (US);
Derek D. Hass, Charlottesville, VA (US);
Haydn N. G. Wadley, Keswick, VA (US);
Goesta Mattausch, Dresden, DE;
Henry Morgner, Dresden, DE;
Siegfried Schiller, Dresden, DE;
University of Virginia Patent Foundation, Charlottesville, VA (US);
Abstract
Plasma deposition apparatus () and method that allows metal or nonmetal vapor () to be generated by electron-beam evaporation, guides that vapor using a noble gas stream (containing reactive gases in cases of reactive evaporation), ionizes the dense directed gas and vapor stream at working pressures above about 0.0001 mbar using a hollow cathode plasma arc discharge (), and conveys the ionized vapor and/or gas stream towards the substrate () for impact on the surface at energies varying from thermal levels (as low as about 0.05 eV) up to about 300 eV.