The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 14, 2006

Filed:

Jun. 27, 2003
Applicants:

Hisayoshi Ohba, Kawasaki, JP;

Jun Watanabe, Kawasaki, JP;

Inventors:

Hisayoshi Ohba, Kawasaki, JP;

Jun Watanabe, Kawasaki, JP;

Assignee:

Fujitsu Limited, Kawasaki, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06F 17/50 (2006.01);
U.S. Cl.
CPC ...
Abstract

A method for designing a semiconductor device in which dummy pattern density and design pattern density are equalized on the entire semiconductor chip. A layout pattern for a layout layer in a semiconductor device is divided into divided areas (step S1). A dummy pattern is inserted between design patterns in the divided areas obtained by dividing the layout pattern (step S2). Dummy pattern density and design pattern density in each divided area are calculated (step S3). Pattern rules for a dummy pattern in each divided area are changed so that the dummy pattern density and the design pattern density will be desired values (step S4).


Find Patent Forward Citations

Loading…