The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 14, 2006
Filed:
Jan. 19, 2005
Martin Annis, Cambridge, MA (US);
Martin Annis, Cambridge, MA (US);
Other;
Abstract
A method for substantially reducing the contribution of dense regions of an object while less dense regions of the object are being processed in a laminography blurring system. The method comprises the steps of positioning an x-ray source with a moving fan beam on one side of the object; positioning a row of x-ray detectors on the side of the object opposite that of the x-ray source; sequentially emitting a plurality of x-ray fan beams along an x-ray source line and directed through a focused pixel of the object to the row of x-ray detectors; sampling the x-ray detectors once for each of the fan beams for a total of it samples of intensity I; determining the maximum intensity Ifrom the samples I; choosing a parameter P greater than one; retaining only those samples Ithat are greater than or equal to I/P; summing the retained samples; and normalizing the resultant sum. Normalizing can include multiplying the sum by the total number of samples divided by the number of retained samples.