The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 14, 2006
Filed:
Apr. 03, 2003
Dominique Charmot, Campbell, CA (US);
Han Ting Chang, Livermore, CA (US);
Wenyue Wang, Sunnyvale, CA (US);
Marcelo Piotti, San Jose, CA (US);
Dominique Charmot, Campbell, CA (US);
Han Ting Chang, Livermore, CA (US);
Wenyue Wang, Sunnyvale, CA (US);
Marcelo Piotti, San Jose, CA (US);
Symyx Technologies, Inc., Santa Clara, CA (US);
Abstract
A method of free radical polymerization and for cleaving a thio group from the resulting polymer is provided. The method comprises forming a mixture of one or more monomers, at least one free radical source and a control agent, wherein the control agent comprises a thio moiety. The mixture is polymerized, and the resulting polymer is mixed with a free radical source, and optionally an addition fragmentation agent under cleavage conditions. The thio moiety on the polymer is replaced with a group of interest.