The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 07, 2006
Filed:
Mar. 14, 2003
Victor Il'ich Kopp, Flushing, NY (US);
Azriel Zelig Genack, New York, NY (US);
Victor Il'ich Kopp, Flushing, NY (US);
Azriel Zelig Genack, New York, NY (US);
Chiral Photonics, Inc., Clifton, NJ (US);
Abstract
A chiral structure having an expanded adjustable reflection band to provide broadband tunability is provided. In the preferred embodiment, the chiral structure is implemented as a chiral fiber structure and comprises two or more sequential chiral fiber elements of different pitches, each having a tunable chiral defect generator. The pitches are selected such that the individual photonic band gaps of the elements are formed into one expanded reflection band such that at least one defect state can be formed and moved within the expanded reflection band by selectively activating and adjusting one or more of the tunable chiral defect generator. The tunable chiral defect generators may generate and control defect state(s) in the structure's spectral response by introducing chiral twists and/or spacing between the chiral elements, with the length of the spacings and angles of chiral twists being proportional to the position of the defect state(s) within the reflection band of the structure.