The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 07, 2006
Filed:
Feb. 01, 2003
Michael Benje, Darmstadt, DE;
Dieter Jaculi, Burgkirchen, DE;
Ingolf Mielke, Burgkirchen, DE;
Peter Schwarzmaier, Kastl, DE;
Klaus Krejci, Burghausen, DE;
Joachim Schubert, Burghausen, DE;
Horst Ertl, Pleiskirchen, DE;
Michael Benje, Darmstadt, DE;
Dieter Jaculi, Burgkirchen, DE;
Ingolf Mielke, Burgkirchen, DE;
Peter Schwarzmaier, Kastl, DE;
Klaus Krejci, Burghausen, DE;
Joachim Schubert, Burghausen, DE;
Horst Ertl, Pleiskirchen, DE;
Uhde GmbH, Dortmund, DE;
Vinnolit Technologie GmbH & Co. KG, Burgkirchen, DE;
Abstract
The invention relates to a method for producing high purity 1,2-dichloroethane using a liquid reaction medium that is circulated and that is essentially composed of 1,2-dichloroethane and a catalyst. At least ethylene and chlorine are added to the reaction medium and a mainly chlorine-containing gas flow is dissolved in a part of the reaction medium which is essentially devoid of dissolved ethylene. The gaseous components not dissolved in this solution are removed from the solution by means of a gas-separation device and the solution from which the undissolved gas components were removed is contacted with ethylene which is present in dissolved form.