The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 07, 2006
Filed:
Feb. 17, 2004
Yasuo Kakizaki, Kanagawa, JP;
Masataka Ito, Kanagawa, JP;
Yasuo Kakizaki, Kanagawa, JP;
Masataka Ito, Kanagawa, JP;
Canon Kabushiki Kaisha, Tokyo, JP;
Abstract
This invention provides a method of manufacturing a substrate having a thin buried insulating film. An insulating layer () is formed on a single-crystal Si substrate (). Ions are implanted into the substrate () through the insulating layer () to form an ion-implanted layer (). The insulating layer () is thinned down to form a thin insulating layer (). A thus prepared first substrate is placed on a second substrate () to form a bonded substrate stack (). After that, the bonded substrate stack () is split at the ion-implanted layer ().
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile