The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 07, 2006
Filed:
Apr. 21, 2004
Applicants:
Shinichi Nakata, Tokyo, JP;
Yuji Yamamoto, Tokyo, JP;
Mamoru Okamoto, Tokyo, JP;
Michiaki Sakamoto, Tokyo, JP;
Hironori Kikkawa, Tokyo, JP;
Muneo Maruyama, Tokyo, JP;
Inventors:
Shinichi Nakata, Tokyo, JP;
Yuji Yamamoto, Tokyo, JP;
Mamoru Okamoto, Tokyo, JP;
Michiaki Sakamoto, Tokyo, JP;
Hironori Kikkawa, Tokyo, JP;
Muneo Maruyama, Tokyo, JP;
Assignee:
NEC LCD Technologies, Ltd., , JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/84 (2006.01); H01L 21/20 (2006.01);
U.S. Cl.
CPC ...
Abstract
Alignment marks are formed when source and drain electrodes of a TFT are formed and thereon a thick red filter is formed. So that, the following respective color layers can be made thin on the red filter. Also, the exposure alignment laser permeates in an exposure step, and thereby the alignment marks can be accurately detected.