The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 07, 2006

Filed:

Nov. 21, 2002
Applicants:

David S. Rougvie, Appleton, WI (US);

Jeffrey Joseph Collegnon, Combined Locks, WI (US);

John Lafond, Appleton, WI (US);

Inventors:

David S. Rougvie, Appleton, WI (US);

Jeffrey Joseph Collegnon, Combined Locks, WI (US);

John LaFond, Appleton, WI (US);

Assignee:

Albany International Corp., Albany, NY (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
D21F 1/10 (2006.01); D21F 7/08 (2006.01); D21F 7/12 (2006.01);
U.S. Cl.
CPC ...
Abstract

A papermaker's fabric, usable in the forming section of a paper machine, has three layers of cross-machine-direction (CD) wefts. The forming layer wefts are grouped into pairs. This twinning of the top-layer wefts results in non-equal spacing in the forming layer. This spacing imparts a desired non-uniformity in the web-supporting surface, thereby reducing the fabric diagonal problem. One of the top-layer wefts in each pair is vertically stacked with the middle and wear side layer wefts. The other top-layer wefts in each pair are unstacked. This alignment increases the drainage properties of the fabric. The middle layer wefts provide extra stability in the CD.


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