The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 28, 2006
Filed:
Dec. 10, 2004
Harald Bloess, Radebeul, DE;
Harald Bloess, Radebeul, DE;
Infineon Technologies AG, Munich, DE;
Abstract
The present invention provides a method for the characterization of a depth structure in a substrate at a surface of the substrate, in which a cutout is produced at the surface of the substrate between an imaging device and the depth structure, the cutout being spaced apart from the depth structure. A layer of the substrate, which incipiently cuts the depth structure and the cutout, is removed by means of an ion beam in order to obtain a cut area, the layer and the normal to the area of the surface of the substrate assuming an acute angle that is greater than zero. The cut area is imaged by means of the imaging device in order to characterize the depth structure.