The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 28, 2006
Filed:
May. 25, 2001
Harald T. Van Lintel, Lausanne, CH;
Didier Maillefer, Belmont S/Lausanne, CH;
Stephan Gamper, Pallaigues, CH;
Harald T. Van Lintel, Lausanne, CH;
Didier Maillefer, Belmont S/Lausanne, CH;
Stephan Gamper, Pallaigues, CH;
Debiotech SA, Lausanne, CH;
Abstract
The fluid-flow device () of the invention comprises a stack () covered by a closure wafer (), said stack () comprising a support wafer (), a layer of insulating material (), and a silicon layer (). The closure wafer () and/or said silicon layer () are machined so as to define a cavity () between said closure wafer () and said silicon layer (), said support wafer () has at least one duct () passing right through it, said layer of insulating material () presenting at least one zone () that is entirely free of material placed at least in line with said duct () so as to co-operate with said cavity () to define a moving member () in said silicon layer (), the moving member being suitable under the pressure of liquid in said cavity () for reversibly moving towards said support wafer () until contact is made between said moving member () and said support wafer ().