The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 28, 2006

Filed:

Oct. 21, 2004
Applicants:

Masaaki Imura, Tokyo, JP;

Kenji Inoue, Tokyo, JP;

Eiju Komuro, Tokyo, JP;

Hisatoshi Saitou, Tokyo, JP;

Inventors:

Masaaki Imura, Tokyo, JP;

Kenji Inoue, Tokyo, JP;

Eiju Komuro, Tokyo, JP;

Hisatoshi Saitou, Tokyo, JP;

Assignee:

TDK Corporation, Tokyo, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H05K 3/02 (2006.01); B44C 1/22 (2006.01); H01L 4/04 (2006.01);
U.S. Cl.
CPC ...
Abstract

A method for manufacturing a piezo-resonator including: a first step of forming an upper electrode layeron the piezoelectric film, a second step of coating the upper electrode layerwith a resistand of performing patterning on the resist so as to have a shape of the upper electrode, a third step of masking the patterned resistand removing the upper electrode layerother than masked portions and forming two or more first upper electrodes, a fourth step of removing the resist, a fifth step of coating the first upper electrodeswith a resist and performing patterning on the resist so that the first upper electrodesare partially exposed, a sixth step of etching each of the exposed first upper electrodesby a specified thickness to form a second upper electrode, and a seventh step of removing the resist


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