The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 21, 2006
Filed:
Oct. 22, 2003
Hyouk Kwon, Seoul, KR;
Young-joo Yee, Seongnam, KR;
Hyouk Kwon, Seoul, KR;
Young-Joo Yee, Seongnam, KR;
LG Electronics Inc., Seoul, KR;
Abstract
Disclosed is an appearance processing method comprising: designing a reference appearance for designing a set shape as a theoretical value; producing a specimen; comparing the reference appearance with the specimen and thus setting a deviation region; performing ion beam milling for milling the deviation region of the specimen by ion beam; and comparing the milling-processed specimen with the reference appearance after the ion beam milling thus to obtain a deviation and milling the deviation region repeatedly thus to make the specimen consist with the reference appearance. Accordingly, an arbitrary shape, a minute spherical surface, or an aspheric shape can be precisely processed, and a large quantity of fabrication by a uniform processing precision is possible.