The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 21, 2006
Filed:
Sep. 23, 2004
Thomas John Rapoza, Vernon, CT (US);
Thomas John Rapoza, Vernon, CT (US);
Gerber Scientific International, Inc., South Windsor, CT (US);
Abstract
A method for symmetrically aligning a pattern piece relative to a work material defining a pattern with varying repeat dimensions. The method including selectively capturing first and second images of areal portions of the work material corresponding to respective first and second reference points on said pattern piece, displaying the first and second images adjacent one another, and moving the pattern displayed in one of the first and second images an adjustment distance, such that the pattern defined by the work material is substantially aligned with respect to first and second images. The position of the pattern piece is then moved relative to the work material proportional to the adjustment distance so that the first and second reference points are symmetrically aligned with respect to the repeating pattern. The images can also be rotated about an axis substantially perpendicular to or parallel with the plane of the work material.